Vion Plasma Focused Ion Beam
The FEI Vion™ Plasma Focused Ion Beam System (PFIB) adds significantly more capacity to your lab, with best-in-class milling and imaging performance in a single, easy-to-use instrument. By incorporating plasma ion source technology, the Vion PFIB delivers increased throughput over conventional gallium FIB instruments-with speeds more than 20x faster for site-specific cross-sectioning and large area milling, as well as sample preparation. With both excellent milling precision and high-resolution imaging at low beam currents, the Vion PFIB delivers the speed, accuracy and high contrast images essential for a wide range of process control, failure analysis or materials research applications.
V400ACE™ Focused Ion Beam
The V400ACE™ Focused Ion Beam (FIB) system incorporates the latest developments in ion column design, gas delivery and end point detection to provide fast, efficient, cost-effective editing on advanced integrated circuits. Circuit editing allows product designers to reroute conductive pathways and test the modified circuits in hours, rather than the weeks or months that would be required to generate new masks and process new wafers. Fewer, shorter modification and test cycles allow manufacturers to ramp new processes to profitable high volume yields faster, and be first to market with premium priced new products.